Our Facilities & Advanced Instrumentation

State-of-the-Art Research Infrastructure

Fully Integrated Materials Synthesis & Characterization Facility

At QuadQuantum, we maintain a fully integrated materials synthesis and characterization facility designed to support cutting-edge research in nanomaterials, semiconductors, optoelectronics, and device fabrication. Our laboratory infrastructure combines precision equipment, controlled processing environments, and high-accuracy measurement tools to ensure research-grade outcomes for every project.

Materials Synthesis & Processing Facilities

Precision Equipment for Advanced Materials Research

High Vacuum Sealing Unit

High Vacuum Sealing Unit

Range of Vacuum: Up to 10-6 mbar

Capabilities:

  • Enables hermetic sealing of samples under high-vacuum conditions
  • Ideal for preparing air-sensitive materials, devices, and encapsulated samples
  • Ensures contamination-free sealing for long-term material stability
  • Supports research on 2D materials, nanomaterials, and semiconductor devices
  • Provides consistent, leak-proof sealing for experimental and industrial use

Mechanical Ball Milling System

Model: Spectro Litt KGUD-04

Capacity for Grinding: 1 kg

Capabilities:

  • Enables controlled size reduction of bulk materials into fine powders
  • Effective for producing nanopowders, composites, and homogeneous mixtures
  • Supports mechanical alloying
  • Provides uniform particle size distribution with adjustable milling speed
  • Suitable for oxide materials, chalcogenides, metals, and semiconductor precursors
Mechanical Ball Milling System
Digital Ultrasonic Cleaner

Digital Ultrasonic Cleaner

Model: RoHS PS – 10A

Frequency Range: 40 kHz

Tank Capacity: 1L

Capabilities:

  • Ensures efficient particle removal through high-frequency ultrasonic cavitation
  • Ideal for cleaning substrates, glassware, metal components, and nanomaterial-coated samples
  • Provides uniform cleaning without physical abrasion or damage
  • Digital control ensures precise timing, temperature adjustment
  • Suitable for laboratory, semiconductor, and research environments requiring contamination-free surfaces

Digital Water Bath

Model: KLE JL-545 (6 holes)

Temperature Range: 5°C above ambient to 99°C

Capabilities:

  • Maintains accurate and stable temperature for heating, incubation, and sample preparation
  • Provides uniform thermal distribution with digital temperature control
  • Ensures repeatable heating cycles required for research-quality experiments
  • Supports applications in nanomaterials, semiconductor processing, chemical synthesis, and analytical testing
  • Built-in safety features ensure reliable long-term operation
Digital Water Bath
Centrifuge System

Centrifuge System

Model: REMI R-8C Plus

Maximum Speed: 6000 rpm

Tube Capacity: 12 tubes (compatible with standard laboratory tube sizes)

Capabilities:

  • Provides high-speed centrifugation for efficient separation of suspensions, nanoparticles, precipitates, and biological samples
  • Equipped with 12-tube rotor, enabling simultaneous processing for higher sample throughput
  • Digital speed and timer controls ensure accurate, repeatable, and contamination-free centrifugation
  • Stable and vibration-free performance ensures uniform sedimentation and reliable experimental results

Vacuum Filtration Unit

Filtration Capacity: Depends on flask/filter size (e.g., 250 mL / 500 mL / 1 L)

Operation: Vacuum-assisted solid–liquid separation

Capabilities:

  • Enables fast, efficient filtration using a stable vacuum source, significantly reducing filtration time
  • Ideal for nanoparticle dispersions, chemical solutions, precipitates, and surface-treated materials
  • Ensures cleaner, high-purity filtrate suitable for analytical, chemical, and materials research
  • Compatible with a variety of filter holders, vacuum flasks, Buchner funnels, and filter assemblies
  • Suitable for sample purification, solvent removal, nanomaterial washing, and environmental/water analysis
Vacuum Filtration Unit
Dual Zone Furnace (DZF)

Dual Zone Furnace (DZF) – Direct Vapor Transport (DVT) Method

Temperature Range: Typically up to 1200°C (depends on specific setup)

Operation: Controlled dual-zone thermal gradient for vapor-phase crystal growth

Capabilities:

  • Enables high-quality crystal growth using the Direct Vapor Transport (DVT) method
  • Dual-zone temperature control for precise source and growth management
  • Ideal for bulk, single, and nanostructured crystals with controlled morphology
  • Supports vacuum or inert-gas-sealed quartz ampoules for contamination-free growth
  • Produces defect-minimized crystals for electronic, optoelectronic, and thermoelectric research
  • Robust and reliable for routine and experimental crystal synthesis

Electronic & Optical Characterization Facilities

High-Precision Measurement & Analysis Equipment

Keithley 2401 Source Measure Unit

Keithley 2401 Source Measure Unit

Instrument: Keithley by Tektronics

Model: Keithley 2401

Voltage Range: 0 to ±20 V

Current Range: 0 to ±1 A (with high accuracy)

Power: Up to 20 W

Capabilities:

  • Precise I–V characterization
  • 4-quadrant source & sink operation
  • High-accuracy voltage/current measurement
  • Programmable sweeps (V/I)
  • Ideal for diodes, solar cells, sensors & thin-film devices

UV–Vis Spectrophotometer

Instrument: UV–Vis Spectrophotometer

Model: PerkinElmer Lambda 365+

Wavelength Range: 200-1100 nm

Capabilities:

  • Suitable for solids, liquids, and thin films
  • High-precision Reflectance measurements
  • Accurate Absorption analysis
  • Reliable Transmission profiling
  • Supports materials research, optical characterization, and thin-film evaluation
UV–Vis Spectrophotometer

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